Use of lithography simulation for the calibration of equation-based design rule checks
Proceedings of the 46th Annual Design Automation Conference, Jul 26, 2009
Designers using one-dimension measurements in nanometer designs can&a... more Designers using one-dimension measurements in nanometer designs can't readily identify features prone to excessive variation during processing. Process simulation provides high resolution checking, but requires significant computing resources. Equation-based design rule checking (eqDRC) offers the DRC performance with capture of complex process issues using multi-dimensional equations. One challenge to adopting eqDRC is the definition and calibration of the equations. We
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Papers by Fedor Pikus