High resolution photoemission core level spectroscopy study and TEM analysis of the Ge/As/Si(001) growth
Surface Science, 2001
The deposition of 1 ML of As on Si(001)-(2×1) surface and the heteroepitaxial Ge/As/Si(001)-(2×1)... more The deposition of 1 ML of As on Si(001)-(2×1) surface and the heteroepitaxial Ge/As/Si(001)-(2×1) growth were studied by using high resolution core-level spectroscopy and transmission electron microscopy (TEM). From the spectral decomposition of the Si2p core levels, collected on the Ge/Si interfaces obtained by codepositing As and Ge atoms at different Ge thickness, we identify the contribution of different Si
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Papers by Luisa Ferrari